Situation
Production of solar cells at a constant level of quality is an important success factor. Performance variation between cells is caused during the various process steps. Sheet resistance is affected by parameters that can occur while creating the pn-junction during the thermodynamic process of phosphorus diffusion. DIFF-SHR enables constant and reliable control of sheet resistance, to quickly identify, eliminate, and prevent problems that can cause deviations.
Principle
- Surface photo voltage (SPV)
- Concentric ring electrodes detect the SPV signal
- Sheet resistance is determined using detected potentials
Advantages
- Simple integration
- Non-contact measurement
- single measurement after diffusion, no correlation to measurements before diffusion necessary
- 100% control rate even for cycle times of one second
- Software enables quick evaluation of measurement results
- Additional protocols and interfaces for extended applications are available
Technical Data
Topic |
Description |
Samples to be measured |
- Mono- and multi-crystalline wafers - Ssquare or pseudo square - Textured or non-textured surface - Diffused layer (n+p or p+n) |
Wafer size |
125 … 210 mm |
Measurement range |
8…100 Ohms/sqr |
Measurement spot |
~ 20 mm diameter |
Machine interface (automation) |
- Parallel I/O - Parallel I/O (combined with RS232 for WaferID info) - Profibus |
Data interface (to factory network or automation) |
- OPC (server) - XML via TCP/IP - SECS2 |
Note: All technical details are subject to change without prior notice. Only technical specifications contained in an offer are binding.




