Situation
Wet chemical wafer texturing dramatically influences solar cell performance. While an alkaline process is usually used on monocrystalline wafers, polycrystalline wafers are acid textured. Precise knowledge of the texturing solution's chemical composition is crucial for safe process control.
GP iRED3000 enables fast and reliable inline measurement and analysis of alkaline and acid texturing solutions.
Principle
FT-NIR spectroscopic measurement (based on the Thermo Scientific AntarisTM MX FT-NIR spectrometer):
- Medium to be measured is pumped through an analytical loop
- Infrared light is transmitted through the texture solution in the measurement cell
- Light absorption analysis
- Chemical species concentration in the solution is calculated using a specially developed evaluation method
Advantages
- Fast measurement (approx. one measurement per minute per bath)
- Simultaneous, parallel measurements from up to four baths
- No sampling, no chemicals in spectrometer
- No consumables needed for measurement
- Practically maintenance free
Technical Data
Description |
GP iRED3000 KOH_IPA_Si |
GP iRED3000 HF_HNO3_Si |
Measuring channel |
Up to 4 pro Spektrometer |
Up to 4 pro Spektrometer |
Measured chemicals |
KOH, IPA, Si |
HF, HNO3, Si |
Measuring range |
KOH: 10 - 40 g/l [5%] IPA: 15 - 60 g/l [3%] Si: 0 - 50 g/l [3%] |
HF: 50 - 130 g/l [2%] HNO3: 250 - 400 g/l [3%] Si: 0 - 50 g/l [3%] |
Temperature range |
78 - 82 °C |
6 - 8 °C |
Note: All technical details are subject to change without prior notice. Only technical specifications contained in an offer are binding.